Method and system for configurable contacts for implementing different bias designs of an integrated circuit device

ABSTRACT

In a computer implemented synthesis system, a fabrication method for an integrated circuit device. The method includes receiving a circuit netlist representing a first form of an integrated circuit design to be realized in physical form. A plurality of contacts of the netlist are accessed. The plurality of contacts are configured to implement a second form of the integrated circuit design.

CROSS-REFERENCES TO RELATED APPLICATIONS

This application is a Continuation of and claims priority to U.S. patentapplication Ser. No. 11/018,880, filed on Dec. 20, 2004, which is herebyincorporated by reference in its entirety.

TECHNICAL FIELD

Embodiments relate to body biasing circuits for providing operationalvoltages in integrated circuit devices.

BACKGROUND ART

As the operating voltages for CMOS transistor circuits have decreased,variations in the threshold voltages for the transistors have becomemore significant. Although low operating voltages offer the potentialfor reduced power consumption and higher operating speeds, thresholdvoltage variations due to process and environmental variables oftenprevent optimum efficiency and performance from being achieved.Body-biasing is one mechanism for compensating for threshold voltagevariations, and functions by modifying the body bias potential of thetransistor, allowing the threshold voltage of the transistor to beadjusted electrically. It is important that the design synthesis toolsused to design the body biasing circuit components interoperate properlywith integrated circuit designs that specify standard biasing.

SUMMARY

Embodiments provide a method and system for configurable contactlibraries for implementing different bias designs of an integratedcircuit device.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are incorporated in and form a part ofthis specification, illustrate embodiments and, together with thedescription, serve to explain the principles of the disclosure.

FIG. 1 shows a computer system in accordance with one embodiment.

FIG. 2 shows an exemplary integrated circuit device in accordance withone embodiment.

FIG. 3 shows a schematic diagram of an exemplary circuit element inaccordance with one embodiment.

FIG. 4 shows a layout diagram depicting a layout of a schematic diagramin accordance with one embodiment.

FIG. 5 shows a schematic diagram of an exemplary circuit element inaccordance with one embodiment.

FIG. 6 shows a layout diagram depicting a layout of a schematic diagramin accordance with one embodiment.

DETAILED DESCRIPTION

Reference will now be made in detail to embodiments, examples of whichare illustrated in the accompanying drawings. While embodiments aredescribed, it will be understood that they are not intended to limit thedisclosure. On the contrary, the disclosure is intended to coveralternatives, modifications and equivalents, which may be includedwithin the spirit and scope as defined by the appended claims.Furthermore, in the following detailed description of embodiments,numerous specific details are set forth in order to provide a thoroughunderstanding. However, it will be recognized by one of ordinary skillin the art that the embodiments may be practiced without these specificdetails. In other instances, well-known methods, procedures, components,and circuits have not been described in detail as not to unnecessarilyobscure aspects of the embodiments.

NOTATION AND NOMENCLATURE

Some portions of the detailed descriptions which follow are presented interms of procedures, steps, logic blocks, processing, and other symbolicrepresentations of operations on data bits within a computer memory.These descriptions and representations are the means used by thoseskilled in the data processing arts to convey most effectively thesubstance of their work to others skilled in the art. A procedure,computer executed step, logic block, process, etc., are here, andgenerally, conceived to be self-consistent sequences of steps orinstructions leading to a desired result. The steps are those requiringphysical manipulations of physical quantities. Usually, though notnecessarily, these quantities take the form of electrical or magneticsignals capable of being stored, transferred, combined, compared, andotherwise manipulated in a computer system. It has proven convenient attimes, principally for reasons of common usage, to refer to thesesignals as bits, values, elements, symbols, characters, terms, numbers,or the like.

It should be borne in mind, however, that all of these and similar termsare to be associated with the appropriate physical quantities and aremerely convenient labels applied to these quantities. Unlessspecifically stated otherwise as apparent from the followingdiscussions, it is appreciated that throughout the disclosure,discussions utilizing terms such as “processing,” “computing,”“checking,” “determining,” “optimizing,” or the like, refer to theaction and processes of a computer system, or similar electroniccomputing device, that manipulates and transforms data represented asphysical (electronic) quantities within the computer system's registersand memories into other data similarly represented as physicalquantities within the computer system registers or memories or othersuch information storage, transmission, or display devices.

COMPUTER SYSTEM ENVIRONMENT

Referring to FIG. 1, a computer system 112 is illustrated. Within thefollowing discussions, certain processes and steps are discussed thatare realized, in one embodiment, as a series of instructions (e.g.,software program) that reside within computer readable memory units ofsystem 112 and executed by processors of system 112. When executed, theinstructions cause computer system 112 to perform specific actions andexhibit specific behavior which is described in detail to follow.

Embodiments are operable within a programmed computer aided design (CAD)system. A CAD system 112 operable to implement embodiments is shown inFIG. 1. In general, the CAD system 112 includes an address/data bus 100for communicating information, one or more central processor(s) 101coupled with bus 100 for processing information and instructions, acomputer readable volatile memory unit 102 (e.g., random access memory,static RAM, dynamic RAM, etc.) coupled with bus 100 for storinginformation and instructions for the central processor(s) 101, acomputer readable non-volatile memory unit 103 (e.g., read only memory,programmable ROM, flash memory, EPROM, EEPROM, etc.) coupled with bus100 for storing static information and instructions for processor(s)101. System 112 can optionally include a mass storage computer readabledata storage device 104, such as a magnetic or optical disk and diskdrive coupled with bus 100 for storing information and instructions.Optionally, system 112 can also include a display device 105 coupled tobus 100 for displaying information to the computer user, an alphanumericinput device 106 including alphanumeric and function keys coupled to bus100 for communicating information and command selections to centralprocessor(s) 101, a cursor control device 107 coupled to bus forcommunicating user input information and command selections to thecentral processor(s) 101, and a signal input/output device 108 coupledto the bus 100 for communicating messages, command selections, data,etc., to and from processor(s) 101.

Program instructions executed by the CAD system can be stored in RAM102, ROM 103, or the storage device 104 and, when executed in a group,can be referred to as logic blocks or procedures. It is appreciated thatdata produced at the various logic synthesis stages, includingrepresentations of the different levels of abstraction of the integratedcircuit design, can also be stored in RAM 102, ROM 103, or the storagedevice 104 as shown in FIG. 1.

The display device 105 of FIG. 1 utilized with the computer system 112may be a liquid crystal device, cathode ray tube, or other displaydevice suitable for creating graphic images and alphanumeric charactersrecognizable to the user. The cursor control device 107 allows thecomputer user to signal dynamically the two dimensional movement of avisible pointer on a display screen of the display device 105. Manyimplementations of the cursor control device are known in the artincluding a trackball, mouse, joystick, or special keys on thealphanumeric input device 105 capable of signaling movement of a givendirection or manner of displacement.

EMBODIMENTS

Embodiments access an integrated circuit netlist representative of theintegrated circuit design and configure a plurality of configurablecontacts to implement a selected form of the integrated circuit design.In one embodiment, the contacts can be configured by a computer-aideddesign tool to implement a standard bias form of the integrated circuitdesign, or a body bias form of the integrated circuit design. Forexample, the body bias form of integrated circuit design is compatiblewith deep N-well (DNW) bias voltage distribution techniques. Theconfigurable contacts can be altered at a cell level throughout thenetlist.

FIG. 2 shows an exemplary body biased integrated circuit device 200 inaccordance with one embodiment. As depicted in FIG. 2, the integratedcircuit device 200 shows a plurality of connections to implementsubstrate body-biasing. For example, a regulation circuit (not shown)can be coupled to provide body bias currents to a PFET 201 through adedicated bias tap 221, or to the NFET 202 through a dedicated bias tap222.

Referring still to FIG. 2, a bias voltage distribution structure may usea deep N-well (DNW) mesh structure 226 to distribute bias voltages. TheN-well bias (Vnw) may be distributed through the mesh structure 226 andthe P-well bias (Vpw) may be distributed through the substrate and thenup through holes 227 in the mesh structure 226 to the P-wells (e.g., Pwell 230). Bias-isolated Vnw regions are formed by N-wells (e.g., DNWplate 235) that are isolated from the DNW mesh structure 226 andprovided dedicated N-taps (e.g., tap 221). Bias-isolated Vpw regions areformed by P-wells contained in isolated tubs (DNW floor 235, NW walls)and provided dedicated P-taps (e.g., tap 222). As shown in FIG. 2, thestructures can be fabricated through different levels of ionimplantation or diffusion. For example, a shallow diffusion can be usedto form the source and drains of the transistors, and so on, asindicated.

FIG. 3 shows a schematic diagram 300 of an exemplary a circuit elementin accordance with one embodiment. As depicted in diagram 300, anexemplary inverter cell is shown, having connections to Vdd and Gnd, andhaving an input and output. Embodiments comprise a computer implementedsynthesis method and system for using configurable contacts (e.g., froma configurable contact library) to implement different forms, versions,alternative implementations, etc. of a given integrated circuit design.Embodiments access, or otherwise receive, an integrated circuit netlistrepresentative of the integrated circuit design that is to be realizedin physical form (e.g., fabricated at a foundry facility). Using thisnetlist, a plurality of configurable contacts are accessed (e.g., by acomputer-aided design tool) and appropriately configured to implement aselected form of the integrated circuit design.

In one embodiment, the contacts can be configured by the computer-aideddesign tool to implement a standard bias form of the integrated circuitdesign, or a body bias form of the integrated circuit design. Theconfigurable contacts can be altered at a cell level throughout thenetlist. Diagram 300 shows a schematic of an example of a standard biasversion of the integrated circuit cell.

FIG. 4 shows a layout diagram 400 depicting the layout of the schematicdiagram 300 (e.g., the exemplary inverter cell) in accordance with oneembodiment. As shown in diagram 400, a metal trace 403 is shown fordistributing Vdd to the N-diffusion 402 residing in the N-well 401. Aplurality of configurable contacts, depicted diagram 400 as smallsquares, couple the trace 403 to the N-diffusion 402 and to the sourcediffusion 405 (e.g., three of such contacts, of the plurality ofcontacts, are identified as shown by the lines 450). A gate 407 and thedrain 406 are shown. A metal trace 408 connects to the drain 406 and asource 412 for the output, and the input is connected to the gate 407 asshown. A metal trace 409 (e.g., Gnd) is connected to a P-diffusion 410and a drain 411.

As described above, the configurable contacts are depicted in diagram400 as small squares (e.g., contacts 450, etc.). In one embodiment, toimplement a standard bias version of the integrated circuit cell, thecomputer-aided design tool leaves the contacts within the netlist. Whenthe configurable contacts are left within the netlist, they are used bymask generation tools to actually implement electrical contacts to themetal trace as depicted diagram 400. This results in the contacts beingmade when the integrated circuit is fabricated (e.g. a semiconductorfabrication foundry). In this manner, the contacts are regarded as beingin the “closed” state.

FIG. 5 shows a schematic diagram 500 of a circuit element in accordancewith one embodiment. As depicted in diagram 500, in a mannersubstantially similar as shown in diagram 300, an exemplary invertercell is shown, having connections to Vdd, Gnd, and having an input andoutput. The inverter cell of diagram 500, however, explicitly depictsthe configurable contacts as switches 501-502. This illustrates theprinciple whereby the contacts can be viewed as switchable contacts,which can be configured in a closed state or an open state. When thecontacts are configured as closed, the inverter cell of diagram 500 is astandard bias inverter cell, where for example N-well bias is connecteddirectly to Vdd. When the contacts are configured as open, the invertercell is a body bias inverter cell, where the N-well bias is connected toa bias distribution structure (e.g., mesh structure 226) as opposed toVdd. This renders the inverter cell compatible with substratebody-biasing implementations as described above in the discussion ofFIG. 2.

FIG. 6 shows a layout diagram 600 depicting the layout of the schematicdiagram 500. The plurality of configurable contacts are depicted diagram600 as small squares, however in this case, the configurable contactsare in an open state in the small squares depicted having an “x” throughthem. Three of such contacts, of the plurality of contacts, areidentified as shown by the lines 650. Since the contacts are configuredopen, the inverter cell of diagram 600 is a body bias inverter cell. Inone embodiment, as described above, to implement a body bias version ofthe integrated circuit cell, the computer-aided design tool does notimplement the contacts within the netlist. When the configurablecontacts are not implemented (e.g., or otherwise removed, ignored,etc.), the mask generation tools do not implement electrical contacts tothe metal traces. This results in the contacts not being made when theintegrated circuit is fabricated. In this manner, the contacts areregarded as being in the open state. As described above, this rendersthe inverter cell compatible with substrate body-biasing techniquesdescribed in the discussion of FIG. 2. Thus, in one embodiment theconfigurable contacts can be regarded as a netlist of circuit elementshaving two states, either open or closed. Alternatively, theconfigurable contacts can be regarded as circuit elements which are leftwithin the netlist (e.g., in the closed state) or removed from thenetlist (e.g., in the open state) by a computer-aided design tooldepending upon whether a standard bias version or a body bias version ofthe integrated circuit design is desired.

Referring still to FIG. 6, one embodiment manages contact configurationthrough the use of configurable, or switchable, contacts from a celllibrary. This facilitates a highly granular control of the configurationof the contacts within the netlist. For example, in one embodiment, onestyle of contact can be used for all contact purposes within thenetlist. For example, in one embodiment, the configurable contacts inthe library can be of two types, “+” type and “x” type. Type + is alwayskept (e.g., always closed). Type x configurable contacts are either openor closed depending upon whether a standard bias design or a body biasdesign is desired. For example, as described above, type x configurablecontacts are closed (e.g., left within the netlist) for standard biasdesigns, and open (e.g., ignored within the netlist) for body biasdesigns.

It should be noted that since all instances of a configurable librarycell can be the same, the nesting structure of the netlist of theintegrated circuit design is undisturbed by the conversion betweenstandard bias and body bias designs. In this manner, a configurablecontact library allows fully hierarchical processing of the chip shapedatabase for contact deletion and subsequent checking.

Additionally, it should be noted that although a configurable contactlibrary method is particularly well suited to standard cell-baseddesign, the method can be applied to any design where thecontact-containing components (e.g. blocks, macros, power connectioncells, etc.) are kept in libraries.

It should be noted that a configurable contact library allowing fullyhierarchical processing can be executed by computer-aided design toolsmuch more efficiently than other methods involving contact deletion. Forexample, in one method where comparatively simple contact deletion isused to convert conventional standard bias designs to body bias designs,contacts must be analyzed, selected, and removed from a “flattened”version of the integrated circuit design database. This flattenedconversion of the integrated circuit design database is nothierarchical. This can require flat processing of the chip shapedatabase for contact deletion and subsequent checking, which is muchmore demanding of computer system resources and executes with much lessefficiency.

The foregoing descriptions of specific embodiments have been presentedfor purposes of illustration and description. They are not intended tobe exhaustive or to limit the disclosure to the precise forms disclosed,and obviously many modifications and variations are possible in light ofthe above teaching. The embodiments were chosen and described in orderto best explain the principles of the disclosure and its practicalapplication, to thereby enable others skilled in the art to best utilizethe disclosure and various embodiments with various modifications as aresuited to the particular use contemplated. It is intended that the scopebe defined by the claims appended hereto and their equivalents.

1. A method comprising: if a state of a circuit element in a circuitlayout is a first state, allowing the circuit element in a maskgeneration process for fabrication of the circuit layout; and if thestate is a second state, omitting the circuit element from the maskgeneration process for fabrication of the circuit layout.
 2. The methodof claim 1, wherein the circuit element comprises a contact.
 3. Themethod of claim 2, wherein the first state is a closed state.
 4. Themethod of claim 3, wherein the circuit layout includes a bias formatindependent of a substrate body bias arrangement.
 5. The method of claim2, wherein the second state is an open state.
 6. The method of claim 5,wherein the circuit layout includes a bias format dependent on asubstrate body bias arrangement.
 7. The method of claim 1 furthercomprising: if the state is the first state, forming a first version ofthe circuit layout; and if the state is the second state, forming asecond version of the circuit layout.
 8. A method comprising: using afirst version of a circuit element and a second version of the circuitelement in a circuit layout; if a state of the first version of thecircuit element is a first state, allowing the first version of thecircuit element and the second version of the circuit element in a maskgeneration process for fabrication of the circuit layout; and if thestate is a second state, omitting the first version of the circuitelement from the mask generation process for fabrication of the circuitlayout and allowing the second version of the circuit element in themask generation process for fabrication of the circuit layout.
 9. Themethod of claim 8, wherein the circuit element comprises a contact. 10.The method of claim 9, wherein the first state is a closed state. 11.The method of claim 10, wherein the circuit layout includes a biasformat independent of a substrate body bias arrangement.
 12. The methodof claim 9, wherein the second state is an open state.
 13. The method ofclaim 12, wherein the circuit layout includes a bias format dependent ona substrate body bias arrangement.
 14. The method of claim 8 furthercomprising: if the state is the first state, forming a first fabricationversion of the circuit layout; and if the state is the second state,forming a second fabrication version of the circuit layout.
 15. Acomputer-readable medium comprising computer-executable instructionsstored therein, the computer-executable instructions comprising:instructions to allow a circuit element of a circuit layout in a maskgeneration process for fabrication of the circuit layout if the state ofthe circuit element is a first state; and instructions to omit thecircuit element from the mask generation process for fabrication of thecircuit layout if the state is a second state.
 16. The computer-readablemedium of claim 15, wherein the circuit element comprises a contact. 17.The computer-readable medium of claim 16, wherein the first state is aclosed state.
 18. The computer-readable medium of claim 17, wherein thecircuit layout includes a bias format independent of a substrate bodybias arrangement.
 19. The computer-readable medium of claim 16, whereinthe second state is an open state.
 20. The computer-readable medium ofclaim 19, wherein the circuit layout includes a bias format dependent ona substrate body bias arrangement.